The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2022
Filed:
Jun. 21, 2021
Western Digital Technologies, Inc., San Jose, CA (US);
Kai Tang, San Jose, CA (US);
Western Digital Technologies, Inc., San Jose, CA (US);
Abstract
Magnetic recording media including a soft magnetic underlayer (SUL) formed over a plasma-polished substrate or pre-seed layer. In some examples, the substrate or pre-seed layer is plasma-polished using an inert gas such as krypton so that the roughness of the surface on which the SUL is deposited is reduced. The roughness reduction can lead to improved crystallographic texture within subsequently deposited media films, and consequently, to increased recording performance of the media. In particular, media signal-to-noise ratio (SNR), linear recording density, and areal recording density or areal density capacity (ADC) can be improved. In one aspect, a carbon deposition/etching apparatus may be modified to polish the substrate or pre-seed layer with krypton or other inert gases, rather than be used to deposit carbon overcoat.