The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 22, 2022
Filed:
Oct. 05, 2018
Zebra Technologies Corporation, Lincolnshire, IL (US);
Raymond Phan, Mississauga, CA;
Yuanhao Yu, Mississauga, CA;
Richard Jeffrey Rzeszutek, Toronto, CA;
Joseph Lam, North York, CA;
Zebra Technologies Corporation, Lincolnshire, IL (US);
Abstract
A method of determining a support structure depth of a support structure having a front and a back separated by the support structure depth includes: obtaining a point cloud of the support structure, and a mask indicating, for a plurality of portions of an image of the support structure captured from a capture pose, respective confidence levels that the portions depict the back of the support structure; selecting, from the point cloud, an initial set of points located within a field of view originating at the capture pose; selecting, from the initial set of points, an unoccluded subset of depth measurements, the depth measurements in the unoccluded subset corresponding to respective image coordinates; retrieving, from the mask, a confidence level for each of the depth measurements in the unoccluded subset; and based on the depth measurements in the unoccluded subset and the retrieved confidence levels, determining the support structure depth.