The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2022

Filed:

Jun. 22, 2020
Applicant:

Halliburton Energy Services, Inc., Houston, TX (US);

Inventors:

Aaron M. Beuterbaugh, Spring, TX (US);

Enrique Antonio Reyes, Tomball, TX (US);

Assignee:
Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C09K 8/72 (2006.01); C09K 8/528 (2006.01); C09K 8/70 (2006.01); C09K 8/76 (2006.01); E21B 43/26 (2006.01);
U.S. Cl.
CPC ...
C09K 8/72 (2013.01); C09K 8/528 (2013.01); C09K 8/70 (2013.01); C09K 8/76 (2013.01); E21B 43/26 (2013.01);
Abstract

The rapid reaction of hydrofluoric acid with siliceous materials can make it difficult to increase the permeability of subterranean formations containing siliceous minerals. Methods for stimulating a subterranean formation can comprise: providing a latent hydrofluoric acid composition comprising a degradable matrix, and a hydrofluoric acid precursor dispersed in the degradable matrix; introducing a first treatment fluid containing the latent hydrofluoric acid composition in a non-dissolved form into a wellbore penetrating a subterranean formation comprising a siliceous material; differentially depositing the latent hydrofluoric acid composition upon a portion of the siliceous material in one or more locations; degrading at least a portion of the degradable matrix, thereby exposing at least a portion of the hydrofluoric acid precursor; converting the exposed hydrofluoric acid precursor into hydrofluoric acid; and reacting the hydrofluoric acid with the siliceous material where the latent hydrofluoric acid composition was deposited.


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