The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2022

Filed:

Nov. 22, 2019
Applicant:

Petrochina Company Limited, Beijing, CN;

Inventors:

Xiangfei Geng, Beijing, CN;

Bin Ding, Beijing, CN;

Jianhui Luo, Beijing, CN;

Bo Huang, Beijing, CN;

Jianyong Xie, Beijing, CN;

Pingmei Wang, Beijing, CN;

Yongcan Peng, Beijing, CN;

Baoliang Peng, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 8/584 (2006.01); C09K 8/60 (2006.01); C07C 67/08 (2006.01); C07C 69/76 (2006.01);
U.S. Cl.
CPC ...
C09K 8/604 (2013.01); C07C 67/08 (2013.01); C07C 69/76 (2013.01); C09K 2208/06 (2013.01);
Abstract

A nonionic Gemini surfactant, (octylphenol polyoxyethylene ether disubstituted) dicarboxylic acid diphenyl ether has a structural formula of: and is prepared by a two-step reaction: S1, diphenyl ether 4,4'-dicarboxylic acid is subjected to an acyl chlorination reaction to obtain diphenyl ether 4,4′-dicarbonyl dichloride; S2, diphenyl ether 4,4′-dicarbonyl dichloride is subjected to an esterification reaction with octylphenol polyoxyethylene ether (OP-10) to obtain the target product (octylphenol polyoxyethylene ether disubstituted) dicarboxylic acid diphenyl ether. The surfactant is expected to be applied in tertiary oil recovery as an alkali/surfactant, in polymer/surfactant binary composite flooding, in alkali/surfactant/polymer ternary composite flooding, as a microemulsion emulsifier and the like, and it can also be compounded with a common surfactant to reduce the use cost, and thus create conditions for its large-scale application.


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