The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2022

Filed:

Mar. 25, 2020
Applicant:

Airbus Operations Gmbh, Hamburg, DE;

Inventor:

Pierre C. Zahlen, Hamburg, DE;

Assignee:

Airbus Operations GmbH, Hamburg, DE;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05C 1/08 (2006.01); B05C 9/10 (2006.01); B05C 9/12 (2006.01); B05D 1/32 (2006.01); B05C 21/00 (2006.01); B05D 5/00 (2006.01); B05D 1/28 (2006.01);
U.S. Cl.
CPC ...
B05D 1/325 (2013.01); B05C 1/0808 (2013.01); B05C 9/10 (2013.01); B05C 21/005 (2013.01); B05C 9/12 (2013.01); B05D 1/28 (2013.01); B05D 5/00 (2013.01);
Abstract

A device and method for lacquer transfer includes a lacquer application unit and at least one of a masking application unit and a masking removal unit, the application unit for applying lacquer to a work surface, wherein the masking application unit is configured to apply a masking to the work surface and is attached to the lacquer application unit so the masking application unit is moved in the application direction ahead of the lacquer application unit across the work surface when the lacquer application unit is moved across the work surface in the application direction. The masking removal unit can remove a previously applied masking from the work surface and is attached to the lacquer application unit such that the masking removal unit is moved in the application direction behind the lacquer application unit across the work surface when the lacquer application unit is moved across the work surface in the application direction.


Find Patent Forward Citations

Loading…