The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 22, 2022

Filed:

May. 02, 2018
Applicant:

Topcon Corporation, Tokyo, JP;

Inventors:

Yasufumi Fukuma, Tokyo, JP;

Kazuhiro Oomori, Tokyo, JP;

Assignee:

Topcon Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
A61B 3/10 (2006.01); A61B 3/13 (2006.01);
U.S. Cl.
CPC ...
A61B 3/102 (2013.01); A61B 3/132 (2013.01);
Abstract

The object of the present invention is to develop an ophthalmologic microscope of a new method that increases the degree of freedom in the optical design in the Galilean ophthalmologic microscope provided with an OCT optical system. The present invention provides an ophthalmologic microscopecomprising; an illuminating optical system, an observation optical system; an objective lens; and an OCT optical system, characterized in that the optical axis O-of the OCT optical system does not penetrate through the objective lens, it comprises objective lens for OCTthrough which the optical axis O-of the OCT optical system penetrates, and deflection optical elementsfor scanning of the OCT optical system and the objective lens for OCTare in a substantially optically conjugate positional relation.


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