The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2022
Filed:
Sep. 14, 2018
GM Global Technology Operations Llc, Detroit, MI (US);
Fang Dai, Troy, MI (US);
Shuru Chen, Troy, MI (US);
Meinan He, Sterling Heights, MI (US);
Mei Cai, Bloomfield Hills, MI (US);
GM GLOBAL TECHNOLOGY OPERATIONS LLC, Detroit, MI (US);
Abstract
In a method of manufacturing an electrochemical cell, a porous or non-porous metal substrate may be provided. A precursor solution may be applied to a surface of the metal substrate. The precursor solution may comprise a chalcogen donor compound dissolved in a solvent. The precursor solution may be applied to the surface of the metal substrate such that the chalcogen donor compound reacts with the metal substrate and forms a conformal metal chalcogenide layer on the surface of the metal substrate. A conformal lithium metal layer may be formed on the surface of the metal substrate over the metal chalcogenide layer.