The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2022
Filed:
May. 05, 2017
Applicant:
Applied Materials, Inc, Santa Clara, CA (US);
Inventors:
Jeffrey Chi Cheung, Hayward, CA (US);
John Ghekiere, Marion, MT (US);
Jerry D. Leonhard, Kalispell, MT (US);
David P. Surdock, Kalispell, MT (US);
Benjamin Shafer, Hungry Horse, MT (US);
Ray Young, Kalispell, MT (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/6708 (2013.01); H01L 21/67253 (2013.01); H01L 21/67259 (2013.01); H01L 21/67271 (2013.01); H01L 22/12 (2013.01); H01L 22/26 (2013.01);
Abstract
A substrate etching system includes a support to hold a wafer in a face-up orientation, a dispenser arm movable laterally across the wafer on the support, the dispenser arm supporting a delivery port to selectively dispense a liquid etchant onto a portion of a top face of the wafer, and a monitoring system comprising a probe movable laterally across the wafer on the support.