The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2022

Filed:

Jul. 09, 2019
Applicant:

Hil Applied Medical, Ltd., Jerusalem, IL;

Inventors:

Indranuj Dey, Jerusalem, IL;

Evgeny Papeer, Jerusalem, IL;

Alexander Bespaly, Jerusalem, IL;

Shai Tsipshtein, Jerusalem, IL;

Ynon Hefets, Jerusalem, IL;

Assaf Shaham, Haifa, IL;

Assignee:

HIL Applied Medical, Ltd., Jerusalem, IL;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01J 27/24 (2006.01); G21K 5/10 (2006.01); H01J 3/16 (2006.01); H01J 27/02 (2006.01);
U.S. Cl.
CPC ...
H01J 27/24 (2013.01); G21K 5/10 (2013.01); H01J 3/16 (2013.01); H01J 27/026 (2013.01);
Abstract

Disclosed are systems and methods for generating a beam of charged particles, such as an ion beam. Such a system may comprise an interaction chamber configured to support a target, one or more electromagnetic radiation sources, a sensor, and at least one processor. The one or more electromagnetic radiation sources may be configured to provide a probe beam at a first energy for determining orientation data of the target and a particle-generating beam at a second energy, which is greater than the first energy, for producing a beam of charged particles. The processor may be configured to receive feedback information from the sensor and to cause a change in a relative orientation between the particle-generating beam and the target.


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