The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 15, 2022
Filed:
Oct. 26, 2020
Zili Yi, Burnaby, CA;
Qiang Tang, Burnaby, CA;
Shekoofeh Azizi, Vancouver, CA;
Daesik Jang, Coquitlam, CA;
Zhan Xu, Richmond, CA;
Zili Yi, Burnaby, CA;
Qiang Tang, Burnaby, CA;
Shekoofeh Azizi, Vancouver, CA;
Daesik Jang, Coquitlam, CA;
Zhan Xu, Richmond, CA;
Huawei Technologies Co. Ltd., Shenzhen, CN;
Abstract
Methods and systems for high-resolution image inpainting are disclosed. An original high-resolution image to be inpainted is obtained, as well as an inpainting mask indicating an inside-mask area to be inpainted. The original high-resolution image is down-sampled to obtain a low-resolution image to be inpainted. Using a trained inpainting generator, a low-resolution inpainted image and a set of attention scores are generated from the low-resolution image. The attention scores represent the similarity between inside-mask regions and outside-mask regions. A high-frequency residual image is computed from the original high-resolution image. An aggregated high-frequency residual image is generated using the attention scores, including high-frequency residual information for the inside-mask area. A high-resolution inpainted image is outputted by combining the aggregated high-frequency residual image and a low-frequency inpainted image generated from the low-resolution inpainted image.