The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2022

Filed:

Oct. 20, 2017
Applicant:

Nec Corporation, Tokyo, JP;

Inventors:

Daichi Hasumi, Tokyo, JP;

Satoshi Ikeda, Tokyo, JP;

Shigeyoshi Shima, Tokyo, JP;

Assignee:

NEC CORPORATION, Tokyo, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G06F 21/56 (2013.01); H04L 45/121 (2022.01); H04L 45/302 (2022.01); H04L 45/00 (2022.01); H04L 9/40 (2022.01);
U.S. Cl.
CPC ...
G06F 21/566 (2013.01); H04L 45/121 (2013.01); H04L 45/306 (2013.01); H04L 45/70 (2013.01); H04L 63/1416 (2013.01); H04L 63/1425 (2013.01);
Abstract

Provided is an incident effect range estimation device which estimates the range of the effect of an incident and shortens incident handling time. This incident effect range estimation device is provided with an incident origin log acquisition unit which acquires log information for the incident-originating device which is related to the occurrence of the incident, a communication destination log acquisition unit which acquires, on the basis of the log information for the incident-originating device, log information for a communication destination device which is the communication destination of the incident-originating device, and an effect range estimation unit which estimates the range of the effect of the incident on the basis of the communication destination device. The range of the effect of the incident can thereby be estimated automatically, and thus incident handling time can be shortened significantly.


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