The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2022

Filed:

Nov. 22, 2018
Applicants:

Mitsubishi Chemical Corporation, Chiyoda-ku, JP;

Nanyang Technological University, Singapore, SG;

Inventors:

Hiroshi Niino, Tokyo, JP;

Shunsuke Chatani, Tokyo, JP;

Shuyao Hsu, Tokyo, JP;

Atsushi Goto, Nanyang Avenue, SG;

Longqiang Xiao, Nanyang Avenue, SG;

Jun Jie Chang, Nanyang Avenue, SG;

Assignees:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 287/00 (2006.01);
U.S. Cl.
CPC ...
C08F 287/00 (2013.01); C08F 2410/01 (2013.01);
Abstract

Provided is a block copolymer composition which contains a block copolymer having a specific molecular structure and has a molecular weight distribution within an appropriate range. A polymerizable composition containing a macromonomer (A) which has a group having a radical-reactive unsaturated double bond at one terminal of a poly(meth)acrylate segment, a vinyl monomer (B), and an organic iodine compound (C), or a polymerizable composition containing a macromonomer (A), a vinyl monomer (B), an azo-based radical polymerization initiator (E), and iodine is polymerized to obtain a block copolymer composition containing a block copolymer in which constitutional units of all blocks are derived from vinyl monomers and at least one block has a branched structure.


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