The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2022

Filed:

Sep. 25, 2019
Applicant:

Soochow University, Suzhou, CN;

Inventors:

Jian Zhu, Suzhou, CN;

Xiaofei Huang, Suzhou, CN;

Jiajia Li, Suzhou, CN;

Na Li, Suzhou, CN;

Xiangqiang Pan, Suzhou, CN;

Xiulin Zhu, Suzhou, CN;

Assignee:

SOOCHOW UNIVERSITY, Suzhou, CN;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 2/46 (2006.01); C08F 2/50 (2006.01); C08G 61/04 (2006.01); C08F 116/14 (2006.01); C08F 2/48 (2006.01);
U.S. Cl.
CPC ...
C08F 116/14 (2013.01); C08F 2/48 (2013.01);
Abstract

The invention relates to a method for preparing a vinyl ether polymer by photo-initiated polymerization, which comprises the step of: under a protective atmosphere, performing photo-initiated polymerization on a vinyl ether monomer in the presence of an organic halogenated hydrocarbon and manganese carbonyl under irradiation of light having a wavelength of 365-550 nm at −25° C. to 25° C., to obtain a vinyl ether polymer after the reaction is completed. In the method, a vinyl ether monomer is subjected to cationic polymerization in the presence of manganese carbonyl and an organic halogenated hydrocarbon under visible light, to prepare a vinyl ether polymer with controlled molecular weight and narrow molecular weight distribution.


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