The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 15, 2022

Filed:

Jun. 01, 2019
Applicant:

GM Global Technology Operations Llc, Detroit, MI (US);

Inventors:

Mahmoud Abd Elhamid, Troy, MI (US);

Andrew C. Bobel, Troy, MI (US);

Anil K. Sachdev, Rochester Hills, MI (US);

Mark W. Verbrugge, Troy, MI (US);

Nicholas P. Pieczonka, Windsor, CA;

James R. Salvador, Royal Oak, MI (US);

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C01B 33/021 (2006.01); C01B 33/037 (2006.01);
U.S. Cl.
CPC ...
C01B 33/021 (2013.01); C01B 33/037 (2013.01); C01P 2004/03 (2013.01); C01P 2004/61 (2013.01); C01P 2004/62 (2013.01); C01P 2006/40 (2013.01);
Abstract

Systems, methods and compositions to produce fine powders are described. These include forming a hypereutectic melt including a target material, a sacrificial-matrix material, and an impurity, rapidly cooling the hypereutectic melt to form a hypereutectic alloy having a first phase and a second phase, annealing the hypereutectic alloy to alter a morphology of the target material to thereby produce target particles, and removing the sacrificial matrix to thereby produce a fine powder of the target particles. The first phase is defined by the target material and the second phase is defined by the sacrificial-matrix material. The sacrificial-matrix material forms a sacrificial matrix having the target material dispersed therethrough.


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