The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2022
Filed:
Mar. 13, 2020
Applicant:
Kioxia Corporation, Tokyo, JP;
Inventors:
Takeharu Motokawa, Zushi Kanagawa, JP;
Noriko Sakurai, Yokohama Kanagawa, JP;
Ryu Komatsu, Atsugi Kanagawa, JP;
Hideaki Sakurai, Kawasaki Kanagawa, JP;
Assignee:
Kioxia Corporation, Tokyo, JP;
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/20 (2006.01); G03F 7/09 (2006.01); G03F 9/00 (2006.01); G03F 7/00 (2006.01);
U.S. Cl.
CPC ...
G03F 7/094 (2013.01); G03F 7/0035 (2013.01); G03F 9/7076 (2013.01); G03F 9/7084 (2013.01);
Abstract
According to one embodiment, a pattern forming method includes forming a resist film including a first core material pattern and a second core material pattern, on a first film laminated on a substrate; forming a second film at least on sidewalls of the first and second core material patterns; removing the first core material pattern while not removing the second core material pattern and the second film; and processing the first film by using, as a mask, the second core material pattern and the second film.