The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 08, 2022

Filed:

Aug. 23, 2018
Applicants:

Zeon Corporation, Tokyo, JP;

National University Corporation Nagoya University, Nagoya, JP;

Inventors:

Kousuke Isobe, Tokyo, JP;

Sadaharu Hashimoto, Tokyo, JP;

Atsushi Nozawa, Tokyo, JP;

Atsushi Noro, Nagoya, JP;

Takato Kajita, Nagoya, JP;

Yushu Matsushita, Nagoya, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 297/04 (2006.01); C08J 5/18 (2006.01); C08F 297/08 (2006.01);
U.S. Cl.
CPC ...
C08J 5/18 (2013.01); C08F 297/08 (2013.01); C08F 2420/00 (2013.01); C08F 2500/26 (2013.01); C08J 2325/08 (2013.01);
Abstract

A main purpose of the present invention is to provide a multi-block copolymer composition having good elasticity and excellent stress relaxation properties, as well as small tension set. The present invention achieves the purpose by providing a multi-block copolymer composition obtained by a modification treatment, the composition including a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond to a block copolymer A; wherein the block copolymer A includes a block copolymer A1 having a specific primary structure and a block copolymer A2 having a specific primary structure, and the mass ratio (A1/A2) of the block copolymer A1 and the block copolymer A2 is 100/0 to 50/50.


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