The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 08, 2022

Filed:

Apr. 09, 2021
Applicant:

Flooring Industries Limited, Sarl, Bertrange, LU;

Inventors:

Benny Schacht, Vlamertinge, BE;

Filip Tack, Oudenaarde, BE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B05D 1/32 (2006.01); B44C 5/04 (2006.01); B44C 1/10 (2006.01); B44C 1/22 (2006.01); E04F 13/08 (2006.01); E04F 15/02 (2006.01); B05D 7/06 (2006.01); B05D 5/06 (2006.01); B05D 5/02 (2006.01); B05D 3/12 (2006.01); B05D 3/06 (2006.01); B44C 1/20 (2006.01); B05D 1/26 (2006.01);
U.S. Cl.
CPC ...
B44C 5/04 (2013.01); B05D 1/322 (2013.01); B05D 3/06 (2013.01); B05D 3/12 (2013.01); B05D 5/02 (2013.01); B05D 5/065 (2013.01); B05D 7/06 (2013.01); B44C 1/10 (2013.01); B44C 1/20 (2013.01); B44C 1/22 (2013.01); B44C 5/043 (2013.01); B44C 5/0453 (2013.01); E04F 13/08 (2013.01); E04F 15/02 (2013.01); E04F 15/02033 (2013.01); B05D 1/26 (2013.01);
Abstract

A method may be provided for manufacturing coated panels of the type including at least a substrate and a top layer with a motif. The top layer may be provided on the substrate. The method may involve providing a synthetic material layer on the substrate. A relief may be provided on the surface of the synthetic material layer provided on the substrate. The relief may include a pattern of recesses and/or projections. The relief may be obtained by providing a mask on or in the synthetic material layer. The mask may enable a selective treatment of the synthetic material layer. A material-removing treatment or a material-depositing treatment may be performed on the synthetic material layer, such that the mask at least partially determines the pattern.


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