The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 08, 2022

Filed:

Nov. 13, 2018
Applicant:

Trumpf Werkzeugmaschinen Gmbh + Co. KG, Ditzingen, DE;

Inventors:

Oliver Bocksrocker, Stuttgart, DE;

Stefanie Epple, Esslingen, DE;

Tim Hesse, Ditzingen, DE;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B23K 31/10 (2006.01); B23K 15/08 (2006.01); B23K 26/03 (2006.01); B23K 26/38 (2014.01);
U.S. Cl.
CPC ...
B23K 31/10 (2013.01); B23K 15/08 (2013.01); B23K 26/034 (2013.01); B23K 26/38 (2013.01); B23K 26/032 (2013.01); B23K 26/0344 (2015.10);
Abstract

The disclosure relates to methods and apparatuses for controlling a cutting process in which a workpiece is cut by a high-energy beam. A process light signal is detected emanating from an interaction region of the high-energy beam with the workpiece in a first wavelength range (Δλ), in which at least one metallic constituent (Fe, Cr) of the workpiece has at least one emission line, and in a second wavelength range (Δλ), which differs from the first wavelength range, in which continuum radiation of the workpiece without emission lines is detectable. Vaporization of the at least one metallic constituent (Fe, Cr) is monitored on the basis of an intensity of the process light signal detected in the first wavelength range (Δλ) and on the basis of an intensity of the process light signal detected in the second wavelength range (Δλ).


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