The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 08, 2022
Filed:
Nov. 05, 2015
Geoservices Equipements, Roissy en France, FR;
LA Societe Des Amis DE L'ecole Superieure DE Physique ET Chimie Industrielles DE LA Ville DE Paris, Paris, FR;
Jerome Breviere, Roissy-en-France, FR;
Joachim Pragash Fleury, Paris, FR;
Jerome Vial, Châtillon, FR;
Didier Thiébaut, Paris, FR;
Anouar Essoussi, Villeneuve la Garenne, FR;
Imadeddine Azzouz, Fresnes, FR;
Kamran Danaie, Vincennes, FR;
GEOSERVICES EQUIPEMENTS, Roissy en France, FR;
LA SOCIETE DES AMIS DE L'ECOLE SUPERIEURE DE PHYSIQUE ET CHIMIE INDUSTRIELLES DE LA VILLE DE PARIS, Paris, FR;
Abstract
A silica-based stationary phase for chromatography columns and the methods of preparing such. More particularly, but not by way of limitation, a silica-based stationary phase that is substantially free of polyethers (e.g., polymer glycols). Also, a chromatography column comprising a silica-based stationary phase substantially free of polyethers (e.g., polymer glycols) within its channels as either a thin-film coating and/or a monolith and/or a monolithic coating. More particularly, a micro-electro-mechanical system (MEMS) chromatograph comprising a silica-based monolith substantially free of polyethers (e.g., polymer glycols) as the stationary phase within the micro-channels of the column.