The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Nov. 01, 2022
Filed:
May. 03, 2019
Applicant:
Rohm and Haas Electronic Materials Korea Ltd, Chungcheongnam-do, KR;
Inventors:
Jung-Hwa Lee, Gyeonggi-do, KR;
Geun Huh, Gyeonggi-do, KR;
Ju-Young Jung, Gyeonggi-do, KR;
Yeonok Kim, Gyeonggi-do, KR;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 7/004 (2006.01); G03F 7/022 (2006.01); G03F 7/38 (2006.01); G03F 7/20 (2006.01); C08K 5/13 (2006.01); C08L 33/08 (2006.01); C08L 33/10 (2006.01); C08L 83/04 (2006.01);
U.S. Cl.
CPC ...
G03F 7/0226 (2013.01); G03F 7/2002 (2013.01); G03F 7/38 (2013.01); C08K 5/13 (2013.01); C08L 33/08 (2013.01); C08L 33/10 (2013.01); C08L 83/04 (2013.01);
Abstract
The present invention relates to a positive-type photosensitive resin composition and a cured film prepared therefrom. The positive-type photosensitive resin composition comprises an acrylic copolymer having a dissolution rate to a developer in a specific range and a compound containing a phenolic hydroxyl group, so that it is possible to attain a high contrast and a high sensitivity pattern when a cured film is formed. Further, it is possible to further enhance the adhesiveness of a pattern when a half-tone, as well as a full-tone, is formed.