The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2022

Filed:

Aug. 13, 2020
Applicant:

Applied Materials, Inc., Santa Clara, CA (US);

Inventors:

Levent Colak, Santa Clara, CA (US);

Ludovic Godet, Sunnyvale, CA (US);

Andre P. Labonte, Mechanicville, NY (US);

Assignee:

APPLIED MATERIALS, INC., Santa Clara, CA (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
F21V 8/00 (2006.01);
U.S. Cl.
CPC ...
G02B 6/0065 (2013.01); G02B 6/0016 (2013.01); G02B 6/0038 (2013.01);
Abstract

Embodiments described herein provide for methods of forming optical device structures. The methods utilize rotation of a substrate, to have the optical device structures formed thereon, and tunability of etch rates of a patterned resist disposed over the substrate and one of a device layer or the substrate to form the optical device structures without multiple lithographic patterning steps and angled etch steps.


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