The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2022

Filed:

Jan. 26, 2021
Applicant:

Shanghai Institute of Optics and Fine Mechanics, Chinese Academy of Sciences, Shanghai, CN;

Inventors:

Bin Wang, Shanghai, CN;

Hongji Qi, Shanghai, CN;

Jianda Shao, Shanghai, CN;

Duanyang Chen, Shanghai, CN;

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
C30B 7/08 (2006.01); G02F 1/35 (2006.01); C30B 29/14 (2006.01); G02F 1/355 (2006.01);
U.S. Cl.
CPC ...
C30B 7/08 (2013.01); C30B 29/14 (2013.01); G02F 1/354 (2021.01); G02F 1/3551 (2013.01);
Abstract

A pyramidal growth method for long-seed KDP-type crystal. In the growth method provided by the present invention, the lower end of the long-seed crystal is restricted by a lower tray, and the upper end is free to grow into a pyramidal. At the same time, the four prismatic faces at two directions of [100] and [010] can grow, avoiding growth stress problem during crystal growth, and all cut optical elements have high optical quality. Because the growth process is that four prismatic faces with highly similar growth environments grow at the same time and stirring is applied by blade-like stirring paddles during the crystal growth process, the cut optical elements have high optical uniformity.


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