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The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11485813 B1

PDFFull Text
Date of Patent:
Nov. 01, 2022

Filed:

Oct. 10, 2018

Resin composition for stereolithography

Applicant:

Kuraray Noritake Dental Inc., Kurashiki, JP;

Inventor:

Kenji Suzuki, Niigata, JP;

Assignee:

KURARAY NORITAKE DENTAL INC., Kurashiki, JP;

Attorney:

Oblon, McClelland, Maier & Neustadt, L.L.P.

Primary Examiner:

Brieann R Johnston

Int. Cl.
CPC ...
C08F 220/68 (2006.01); B33Y 70/10 (2020.01); C08K 3/22 (2006.01); C08K 3/36 (2006.01); C08K 5/3475 (2006.01); B33Y 70/00 (2020.01); A61K 6/887 (2020.01); C08K 9/04 (2006.01); C08F 2/44 (2006.01); C08F 2/48 (2006.01); A61C 13/00 (2006.01); B33Y 10/00 (2015.01); B29C 64/124 (2017.01); B29K 509/02 (2006.01);
U.S. Cl.
CPC ...
C08F 220/68 (2013.01); A61C 13/0013 (2013.01); A61K 6/887 (2020.01); B33Y 70/00 (2014.12); B33Y 70/10 (2020.01); C08F 2/44 (2013.01); C08F 2/48 (2013.01); C08K 3/22 (2013.01); C08K 3/36 (2013.01); C08K 5/3475 (2013.01); C08K 9/04 (2013.01); B29C 64/124 (2017.08); B29K 2509/02 (2013.01); B33Y 10/00 (2014.12); C08K 2003/2213 (2013.01); C08K 2003/2227 (2013.01); C08K 2003/2237 (2013.01); C08K 2003/2241 (2013.01); C08K 2003/2244 (2013.01); C08K 2003/2296 (2013.01); C08K 2201/003 (2013.01); C08K 2201/011 (2013.01); C08K 2201/014 (2013.01);
Abstract

The present invention provides a resin composition for stereolithography that, with its low consistency, enables easy fabrication while ensuring good shape accuracy and desirable color masking properties in the cured product. The present invention relates to a resin composition for stereolithography comprising: an 80 to 99 mass % polymerizable monomer (a); a 0.1 to 10 mass % photopolymerization initiator (b); a 0.1 to 5.0 mass % inorganic particle (c) having an average particle diameter of 5 to 200 nm; and a 0.01 to 10 mass % metal oxide particle (d) having an average particle diameter of 0.1 to 10 μm, the inorganic particle (c) being different from the metal oxide particle (d).

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