The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Nov. 01, 2022

Filed:

Jun. 18, 2019
Applicant:

Lg Electronics Inc., Seoul, KR;

Inventors:

Seokhee Yi, Seoul, KR;

Nakyeong Kim, Seoul, KR;

Kwangho An, Seoul, KR;

Assignee:

LG ELECTRONICS INC., Seoul, KR;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
B64C 39/02 (2006.01); B64D 45/08 (2006.01); B64D 47/08 (2006.01); B64F 1/18 (2006.01); G05D 1/10 (2006.01); G05D 1/06 (2006.01);
U.S. Cl.
CPC ...
B64D 45/08 (2013.01); B64C 39/024 (2013.01); B64D 47/08 (2013.01); B64F 1/18 (2013.01); G05D 1/101 (2013.01); B64C 2201/027 (2013.01); G05D 1/0676 (2013.01);
Abstract

Disclosed are a precise landing method using a multi-pattern in an unmanned aerial control system and an apparatus therefor. In an aspect of the present invention, a precise landing method using a multi-pattern of an unmanned aerial robot in an unmanned aerial control system includes receiving an image value from an outside and recognizing a multi-pattern in which control information for precise landing control has been coded based on the image value, obtaining control information when an ID value included in the control information indicates a landing point, moving to the landing point based on the control information, and performing landing at the landing point, and recognizing the multi-pattern again if the landing is not completed. A landing area for the landing of the unmanned aerial robot may include the landing point and the multi-pattern. The multi-pattern may include a first multi-pattern and a second multi-pattern. The first multi-pattern may have a greater size than the second multi-pattern.


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