Apparatus and method for direct patterning of an organic material using an electrostatic mask

Abstract

A deposition system that mitigates feathering in a directly deposited pattern of organic material is disclosed. Deposition systems in accordance with the present disclosure include an evaporation source, an electrically conductive shadow mask, and an electrically conductive field plate. The source imparts a negative charge on vaporized organic molecules as they are emitted toward a target substrate. The source and substrate are biased to produce an electric field having field lines that extend normally between them. The shadow mask and field plate are located between the source and substrate and each functions as an electrostatic lens that directs the charged vapor molecules toward propagation directions aligned with the field lines as the charged vapor molecules approach and pass through them. As a result, the charged vapor molecules pass through the shadow mask to the substrate along directions that are substantially normal to the substrate surface, thereby mitigating feathering in the deposited material pattern.