The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2022
Filed:
Jan. 18, 2019
Applicant:
Asm Ip Holding B.v., Almere, NL;
Inventor:
Timothee Julien Vincent Blanquart, Oud-Heverlee, BE;
Assignee:
ASM IP Holding B.V., Almere, NL;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 21/02 (2006.01); C23C 16/04 (2006.01); C23C 16/455 (2006.01); C23C 16/505 (2006.01); H01J 37/32 (2006.01); H01L 21/762 (2006.01); H01L 21/768 (2006.01);
U.S. Cl.
CPC ...
H01L 21/02274 (2013.01); C23C 16/045 (2013.01); C23C 16/45542 (2013.01); C23C 16/45553 (2013.01); C23C 16/505 (2013.01); H01J 37/32146 (2013.01); H01J 37/32449 (2013.01); H01L 21/0228 (2013.01); H01L 21/02211 (2013.01); H01L 21/76224 (2013.01); H01L 21/76837 (2013.01); H01J 2237/3321 (2013.01); H01J 2237/3382 (2013.01);
Abstract
A film having filling capability of a patterned recess on a surface of a substrate is deposited by forming a viscous material in a gas phase by striking a plasma in a chamber filled with a volatile precursor that can be polymerized within certain parameter ranges which include a partial pressure of the precursor during a plasma strike and substrate temperature.