The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2022
Filed:
Jun. 03, 2021
Applicant:
Applied Materials, Inc., Santa Clara, CA (US);
Inventors:
Craig Richard Chaney, Lanesville, MA (US);
Frank Sinclair, Boston, MA (US);
Daniel R. Tieger, Manchester, MA (US);
Assignee:
Applied Materials, Inc., Santa Clara, CA (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01J 37/00 (2006.01); H01J 37/08 (2006.01); H01J 9/02 (2006.01); H01J 37/317 (2006.01);
U.S. Cl.
CPC ...
H01J 37/08 (2013.01); H01J 9/02 (2013.01); H01J 37/3171 (2013.01); H01J 2237/08 (2013.01);
Abstract
An ion source is provided. The ion source may include an ion source chamber, and a cathode disposed in the ion source chamber and configured to emit electrons to generate a plasma within the ion source chamber, the cathode comprising a refractory metal, wherein the refractory metal comprises a macrocrystalline structure.