The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 25, 2022
Filed:
Sep. 10, 2019
Samsung Electronics Co., Ltd., Suwon-si, KR;
Allan J. Schwade, Santa Cruz, CA (US);
Anil Yadav, Cupertino, CA (US);
Melvin Lobo, Fremont, CA (US);
Samsung Electroncis Co., Ltd., Suwon-Si, KR;
Abstract
A system and method for creating organized intent clusters or scenes using machine learning algorithms is provided. A method of creating organized intent clusters or scenes comprises extracting intent features related to the plurality of request inputs. The method also includes creating a plurality of groups comprising the extracted intent features. The method includes identifying a cluster based on co-occurring extracted intent features, the co-occurring extracted intent features belonging to a plurality of domains. The method further includes generating a proto-scene based in part by ranking the extracted intent features within the cluster.