The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2022

Filed:

Jul. 21, 2020
Applicant:

Armstrong World Industries, Inc., Lancaster, PA (US);

Inventors:

Nathan J. Baxter, Lancaster, PA (US);

James R. Waters, Lancaster, PA (US);

Assignee:

AWI Licensing LLC, Wilmington, DE (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
E04B 9/22 (2006.01); E04B 9/24 (2006.01); E04B 7/14 (2006.01); E04B 9/06 (2006.01); E04B 9/10 (2006.01); E04B 9/18 (2006.01); E04B 9/30 (2006.01); E04B 9/34 (2006.01);
U.S. Cl.
CPC ...
E04B 9/225 (2013.01); E04B 7/14 (2013.01); E04B 9/067 (2013.01); E04B 9/10 (2013.01); E04B 9/18 (2013.01); E04B 9/245 (2013.01); E04B 9/30 (2013.01); E04B 9/34 (2013.01);
Abstract

Disclosed is a suspended ceiling system, a securing member, and process of installing a patterned suspended ceiling system. The suspended ceiling system includes a grid system having first members and second members, and at least one substrate which extends below the grid system. The at least one substrate has an exposed surface and a concealed surface, and the at least one substrate has first sides and second sides which extend between the exposed surface and the concealed surface. Securing members attach to the concealed surface proximate the first sides, and the securing members have grid engagement members which secure the at least one substrate to the grid system. The securing members cooperate with the first members and the second members of the grid system to properly position the substrate and the spacing between adjacent at least one substrates is controlled.


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