The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 25, 2022

Filed:

Jul. 12, 2019
Applicant:

Basf Corporation, Florham Park, NJ (US);

Inventors:

Wolfgang Ruettinger, Iselin, NJ (US);

Laif R. Alden, Iselin, NJ (US);

Steven Wesley Chin, Iselin, NJ (US);

Akash Abraham, Brooklyn, NY (US);

Chen Chen, Shanghai, CN;

Assignee:

BASF Corporation, Florham Park, NJ (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B01D 53/02 (2006.01); B01J 20/20 (2006.01); B01J 20/28 (2006.01); F02M 25/08 (2006.01);
U.S. Cl.
CPC ...
B01J 20/205 (2013.01); B01J 20/2803 (2013.01); B01J 20/28066 (2013.01); B01J 20/28071 (2013.01); B01J 20/28073 (2013.01); F02M 25/0854 (2013.01); B01J 2220/46 (2013.01); B01J 2220/4812 (2013.01);
Abstract

A coated substrate () adapted for hydrocarbon adsorption having at least one surface, and a coating on the at least one surface, the coating comprising particulate carbon and a binder, wherein the particulate carbon has a BET surface area of at least about 1300 m/g; and at least one of: (i) a butane affinity of greater than 60% at 5% butane; (ii) a butane affinity of greater than 35% at 0.5% butane; (iii) a micropore volume greater than about 0.2 ml/g and a mesopore volume greater than about 0.5 ml/g. A bleed emission scrubber () and an evaporative emission control canister system () comprising the coated substrate () are provided. They can control evaporative hydrocarbon emissions and may provide low diurnal breathing loss (DBL) emissions even under a low purge condition.


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