The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2022

Filed:

Jun. 14, 2019
Applicant:

City University of Hong Kong, Kowloon, HK;

Inventors:

Kwok Wa Leung, Kowloon Tong, HK;

Yuxiang Sun, Kowloon, HK;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01Q 19/10 (2006.01); H01Q 15/14 (2006.01); H01P 11/00 (2006.01);
U.S. Cl.
CPC ...
H01Q 19/10 (2013.01); H01P 11/001 (2013.01); H01Q 15/141 (2013.01);
Abstract

The invention relates to a method for making a dielectric reflectarray antenna, and a dielectric reflectarray antenna made using such method. The method includes removing, from a substrate having a dielectric layer and a first outer metallic layer arranged on one side of the dielectric layer, the first outer metallic layer to form an intermediate substrate. The method also includes cutting the intermediate substrate to integrally form a dielectric reflectarray with an array of dielectric reflector elements of the dielectric reflectarray antenna.


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Leung, Kwok. (2022). Dielectric reflectarray antenna and method for making the same (U.S. Patent No. 11476587). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11476587

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