The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2022

Filed:

Apr. 27, 2020
Applicant:

Renesas Electronics Corporation, Tokyo, JP;

Inventor:

Tadashi Yamaguchi, Tokyo, JP;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H01L 29/51 (2006.01); H01L 29/66 (2006.01); H01L 21/02 (2006.01); H01L 29/78 (2006.01); H01L 21/28 (2006.01); H01L 27/11568 (2017.01); H01L 21/3105 (2006.01); H01L 49/02 (2006.01); H01L 27/11507 (2017.01); H01L 27/1159 (2017.01);
U.S. Cl.
CPC ...
H01L 29/40111 (2019.08); H01L 21/02181 (2013.01); H01L 21/02189 (2013.01); H01L 21/02197 (2013.01); H01L 21/02345 (2013.01); H01L 21/02356 (2013.01); H01L 21/3105 (2013.01); H01L 27/11568 (2013.01); H01L 28/40 (2013.01); H01L 29/516 (2013.01); H01L 29/6684 (2013.01); H01L 27/1159 (2013.01); H01L 27/11507 (2013.01); H01L 29/78391 (2014.09);
Abstract

To allow a metal oxide film composed mainly of O and at least one of Hf and Zr to exhibit ferroelectric properties. After deposition of a hafnium oxide film on a semiconductor substrate via an insulating film, the semiconductor substrate is exposed to microwaves to selectively heat the hafnium oxide film. This makes it possible to form a larger number of orthorhombic crystals in the crystals of the hafnium oxide film. The hafnium oxide film thus obtained can therefore exhibit ferroelectric properties without adding, thereto, an impurity such as Si. This means that the hafnium oxide film having a reverse size effect can be used as a ferroelectric film of a ferroelectric memory cell and contributes to the manufacture of a miniaturized ferroelectric memory cell.


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