The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2022

Filed:

Jun. 04, 2019
Applicant:

Magik Eye Inc., New York, NY (US);

Inventors:

Akiteru Kimura, Hachioji, JP;

Jan Heller, Prague, CZ;

Assignee:

Magik Eye Inc., New York, NY (US);

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
H04B 10/00 (2013.01); G01S 17/48 (2006.01); G01S 17/32 (2020.01); G01S 17/89 (2020.01);
U.S. Cl.
CPC ...
G01S 17/48 (2013.01); G01S 17/32 (2013.01); G01S 17/89 (2013.01);
Abstract

In one example, a method includes instructing, by a processing system of a distance sensor, a pattern projector of the distance sensor to project a pattern of light onto an object, wherein the pattern comprises a plurality projection artifacts, detecting, by the processing system, a location of a first projection artifact of the plurality of artifacts in an image of the object that includes the pattern of light, wherein the detecting comprises identifying an area of peak light intensity within a window corresponding to a trajectory of the first projection artifact, wherein the trajectory represents a range of potential movement of the first projection artifact on an imaging sensor of the distance sensor, and calculating, by the processing system, a distance from the distance sensor to the object based in part on the location of the first projection artifact.


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