logo

For the Inventor, By the Inventor

The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Patent No.:

US 11474027 B1

PDFFull Text
Date of Patent:
Oct. 18, 2022

Filed:

Aug. 10, 2021

Method and system for regulating photoelectric spectral response range

Applicant:

Jilin University, Changchun, CN;

Inventors:

Quanjun Li, Changchun, CN;

Zonglun Li, Changchun, CN;

Haiyan Li, Changchun, CN;

Bingbing Liu, Changchun, CN;

Assignee:

Jilin University, Changchun, CN;

Attorneys:

Bochner IP, PLLC

Andrew D. Bochner

Primary Examiner:

David P Porta

Assistant Examiner:

Meenakshi S Sahu

Int. Cl.
CPC ...
G01N 21/27 (2006.01); H04N 5/33 (2006.01); H01L 27/146 (2006.01); G01J 1/42 (2006.01);
U.S. Cl.
CPC ...
G01N 21/27 (2013.01); G01J 1/42 (2013.01); H01L 27/14649 (2013.01); H04N 5/33 (2013.01);
Abstract

A method for regulating a photoelectric spectral response range, including: pre-pressurizing a gasket material, and drilling a circular hole at the center of indentation as a sample chamber; padding the sample chamber with a layer of photoelectric material, where two ends of the photoelectric material each are connected to one platinum sheet as an electrode; respectively connecting the two electrodes to probes of a digital source-meter, and using the digital source-meter to apply a 5 V bias voltage to the photoelectric material; placing a pressure calibration substance for pressure calibration; applying a high pressure to the photoelectric material, to make a pressure in the sample chamber reach a preset pressure; irradiating a near-infrared laser onto the photoelectric material through diamonds, controlling the presence or absence of illumination, and using the digital source-meter to display a current-time curve at the preset pressure; and determining a photoelectric spectral response range.

Find Patent Forward Citations

Li, Quanjun. (2022). Method and system for regulating photoelectric spectral response range (U.S. Patent No. 11474027). U.S. Patent and Trademark Office. https://idiyas.com/patent/badge/11474027

Data source: USPTO (United States Patent and Trademark Office) public patent records. Weekly synchronization. How IDiyas builds this profile

Loading…