The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2022
Filed:
Apr. 23, 2018
Tianjin University, Tianjin, CN;
Shuang Wang, Tianjin, CN;
Junfeng Jiang, Tianjin, CN;
Tiegen Liu, Tianjin, CN;
Xue Wang, Tianjin, CN;
Kun Liu, Tianjin, CN;
Mengnan Xiao, Tianjin, CN;
Dongdong Ju, Tianjin, CN;
TIANJIN UNIVERSITY, Tianjin, CN;
Abstract
The present invention discloses a residual pressure measurement system for a MEMS pressure sensor with an F-P cavity and method thereof, the measurement system includes a low-coherence light source, a 3 dB coupler, a MEMS pressure sensor, an air pressure chamber, a thermostat, a pressure control system, a cavity length demodulator, an acquisition card and a computer. The measurement method comprises: performing cavity length measurement by using the reflecting light by the pressure control system at two temperatures, respectively, so as to calibrate the MEMS pressure sensor and establish a relationship between the absolute phase of a monochromatic frequency and the external pressure; performing linear fitting to the two measurement data to obtain all the external pressure when the cavity length of two measurement data are equal to each other, and substituting the theoretical equation for calculation to obtain the residual pressure under the flat condition of the diaphragm.