The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 18, 2022
Filed:
Mar. 16, 2018
Applicant:
United Technologies Corporation, Farmington, CT (US);
Inventor:
Michael N. Task, Vernon, CT (US);
Assignee:
Raytheon Technologies Corporation, Farmington, CT (US);
Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 16/455 (2006.01); C23C 16/40 (2006.01); F01D 5/28 (2006.01); F01D 5/34 (2006.01); F01D 25/00 (2006.01); F01D 5/02 (2006.01);
U.S. Cl.
CPC ...
C23C 16/45553 (2013.01); C23C 16/403 (2013.01); C23C 16/405 (2013.01); C23C 16/45555 (2013.01); F01D 5/02 (2013.01); F01D 5/288 (2013.01); F01D 5/34 (2013.01); F01D 25/007 (2013.01); F05D 2220/32 (2013.01); F05D 2230/314 (2013.01); F05D 2230/90 (2013.01); F05D 2300/21 (2013.01); F05D 2300/2112 (2013.01); F05D 2300/2118 (2013.01); F05D 2300/611 (2013.01);
Abstract
A process for coating a gas turbine engine disk comprises placing the disk having an outer surface into a chamber, the chamber configured to perform atomic layer deposition; injecting a first reactant into the chamber; forming a first monolayer gas thin film on the outer surface; removing the first reactant from the chamber; injecting a second reactant into the chamber; reacting second reactant with the first monolayer gas thin film; removing the second reactant from the chamber; and forming a protective barrier coating on the outer surface.