The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 18, 2022

Filed:

Mar. 11, 2019
Applicant:

Planmeca Oy, Helsinki, FI;

Inventor:

Samppa Dravantti, Helsinki, FI;

Assignee:

Other;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B29C 64/245 (2017.01); B33Y 30/00 (2015.01); B29C 64/232 (2017.01); B29C 64/124 (2017.01);
U.S. Cl.
CPC ...
B29C 64/245 (2017.08); B29C 64/124 (2017.08); B29C 64/232 (2017.08); B33Y 30/00 (2014.12);
Abstract

A stereolithography apparatus comprises a build platform () connected to a movable frame () via a ball joint (). The ball joint () permits a limited range of movement of the build platform in all directions. A locking mechanism () is configured to lock the ball joint () stationary for calibration of the orientation angle of the build platform () in relation to the exposure arrangement (), so that the lower surface () of the build platform is parallel with the second upper surface () of the exposure arrangement (). The ball joint () comprises a ball member () attached to the build platform () and a socket member (--) connected to the frame (). A vertical guide () is arranged in the frame (). The socket member () is arranged movable vertically inside and along the guide () to permit a limited vertical movement of the socket member () in relation to the frame (). The locking mechanism () is configured to lock also the socket member (--) stationary for calibration of the vertical position of the build platform to determine a zero level of the build platform () in relation to the second upper surface () of the exposure arrangement ().


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