The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2022

Filed:

May. 25, 2017
Applicants:

Brad Winston Hoff, Albuquerque, NM (US);

David Michael French, Portland, OR (US);

Inventors:

Brad Winston Hoff, Albuquerque, NM (US);

David Michael French, Portland, OR (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H05B 6/02 (2006.01); H05B 6/64 (2006.01); H05B 6/68 (2006.01); H05B 6/46 (2006.01); H05B 6/00 (2006.01);
U.S. Cl.
CPC ...
H05B 6/02 (2013.01); H05B 6/00 (2013.01); H05B 6/46 (2013.01); H05B 6/64 (2013.01); H05B 6/68 (2013.01);
Abstract

An electrode is embedded in a piece of ceramic material having a population of conduction band electrons. Applying a voltage bias to the electrode causes electrons to flow towards or away from the electrode to form a positively charged sheath either a distance apart from or adjacent the electrode, depending the polarity of the bias. The electron flow also forms a negatively charged sheath lying opposite the positively charged sheath, and an electrically neutral region lying between the two sheaths. Electromagnetic radiation impinging the ceramic material heats the ceramic where the radiation is absorbed by the electron population. As the incident radiation is absorbed in proportion to the electron density, heating is increased in the negatively charged sheath, relative to the other parts of the ceramic material. The location of heating is controlled by controlling the magnitude and polarity of the voltage bias.


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