The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2022

Filed:

Sep. 09, 2020
Applicant:

Kioxia Corporation, Tokyo, JP;

Inventors:

Yukako Tanaka, Yokkaichi, JP;

Sho Saiki, Yokkaichi, JP;

Kaito Date, Yokkaichi, JP;

Yuka Shibata, Yokkaichi, JP;

Assignee:

Kioxia Corporation, Tokyo, JP;

Attorney:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
H01L 21/67 (2006.01); H01L 21/66 (2006.01);
U.S. Cl.
CPC ...
H01L 21/67253 (2013.01); H01L 21/67276 (2013.01); H01L 21/67288 (2013.01); H01L 22/20 (2013.01);
Abstract

A semiconductor process analysis device of an embodiment includes a memory and a processor connected to the memory. The processor performs factoring to inspection result groups resulting from inspections of a substrate group, the inspections including an inspection of a fabrication process of a semiconductor integrated circuit. The inspection result groups are first distribution groups resulting from a single inspection of each substrate of the substrate group. Each first distribution represents a distribution of inspection data on a substrate surface. The factoring includes calculating, from the first distribution groups, for each of one or more second distributions, appearance information containing a degree of appearance of one of the one or more second distributions in each substrate. The processor calculates a degree of association between two items of the appearance information, the two items respectively corresponding to different inspection result groups among the inspection result groups.


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