The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2022

Filed:

Jun. 10, 2019
Applicant:

Innoveering, Llc, Ronkonkoma, NY (US);

Inventors:

George Papadopoulos, Nesconset, NY (US);

Daniel Bivolaru, Hampton, VA (US);

Jiaji Lin, Flushing, NY (US);

Assignee:

INNOVEERING, LLC, Ronkonkoma, NY (US);

Attorneys:
Primary Examiner:
Int. Cl.
CPC ...
H01J 37/32 (2006.01);
U.S. Cl.
CPC ...
H01J 37/32568 (2013.01); H01J 37/32926 (2013.01); H01J 37/32972 (2013.01);
Abstract

This disclosure relates to systems and methods element identification and quantification. The method includes generating pulsed plasma based on an input voltage and a current so that the pulsed plasma interacts with a particle and atomizes the particle when the pulsed plasma is disposed in a flow field, identifying an atomic emission of the pulsed plasma with an optical sensor, determining element identification and quantification based on the identified emission of pulsed plasma, generating DC plasma having an electrical field based on an input DC voltage and a DC current, positioning the DC plasma in a flow field, detecting a change in the electrical field of the DC plasma, and determining a size of the particle based on the change in electrical field.


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