The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2022

Filed:

Jan. 03, 2019
Applicant:

Boe Technology Group Co., Ltd., Beijing, CN;

Inventors:

Kang Guo, Beijing, CN;

Lu Wang, Beijing, CN;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
G03F 1/68 (2012.01); H01L 21/033 (2006.01); H01L 21/302 (2006.01); G03F 7/40 (2006.01); H01S 5/02 (2006.01); G02B 5/18 (2006.01); G03F 7/20 (2006.01); B24B 19/02 (2006.01);
U.S. Cl.
CPC ...
G03F 1/68 (2013.01); G02B 5/1809 (2013.01); G02B 5/1857 (2013.01); G03F 7/40 (2013.01); G03F 7/70383 (2013.01); G03F 7/70408 (2013.01); H01L 21/0337 (2013.01); H01L 21/302 (2013.01); H01S 5/0203 (2013.01); B24B 19/02 (2013.01);
Abstract

A manufacturing method of a template includes: providing a base; forming a photoresist pattern on the base and patterning the base by using the photoresist pattern as a mask, and the forming the photoresist pattern includes: forming a plurality of first patterns spaced apart from each other on the base; forming a first material layer on the plurality of first patterns; patterning the at least one first pattern by using the first material layer as a mask so that the first pattern is formed into at least one first sub-pattern; and removing the first material layer; and the first material layer at least cover one side of at least one of the plurality of first patterns in a direction perpendicular to a surface on which the base is located.


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