The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2022

Filed:

Jul. 26, 2019
Applicant:

Wuhan University, Wuhan, CN;

Inventors:

Shengwen Tang, Wuhan, CN;

Hubao A, Wuhan, CN;

Wenzhi Yu, Wuhan, CN;

Wei Zhou, Wuhan, CN;

Jingtao Chen, Wuhan, CN;

Zhen He, Wuhan, CN;

Assignee:

WUHAN UNIVERSITY, Wuhan, CN;

Attorneys:
Primary Examiner:
Assistant Examiner:
Int. Cl.
CPC ...
C23C 14/35 (2006.01); C23C 14/34 (2006.01); B22F 1/142 (2022.01); C23C 14/58 (2006.01); C23C 14/10 (2006.01); C23C 14/08 (2006.01); H01J 37/34 (2006.01); B82Y 30/00 (2011.01); B82Y 40/00 (2011.01);
U.S. Cl.
CPC ...
C23C 14/35 (2013.01); B22F 1/142 (2022.01); C23C 14/082 (2013.01); C23C 14/10 (2013.01); C23C 14/3414 (2013.01); C23C 14/5846 (2013.01); H01J 37/3405 (2013.01); B22F 2201/12 (2013.01); B22F 2202/05 (2013.01); B22F 2302/45 (2013.01); B82Y 30/00 (2013.01); B82Y 40/00 (2013.01); H01J 2237/332 (2013.01);
Abstract

A method of preparing a hydrated calcium silicate (C—S—H) nano-film. The method includes: 1) synthesizing a hydrated calcium silicate powder having a calcium to silicon ratio (Ca/Si) of 0.5-3.0; 2) calcining the C—S—H powder obtained in 1) for 2-3 hours under a temperature of 150-250° C., cooling to approximately 25° C., and pressing the C—S—H powder under a pressure of 100-200 megapascal, to yield a target material; 3) fixing a substrate on a sample table of a magnetron sputtering apparatus, placing the target material obtained in 2) in a target position of the magnetron sputtering apparatus, pre-sputtering the target material for 5-10 minutes, rotating the substrate at a constant speed, sputtering the target material for 30-300 minutes, to yield a nano-film; and 4) soaking the nano-film obtained in 3) into in a saturated aqueous solution of calcium hydroxide at approximately 25° C. for 1-3 days.


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