The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2022
Filed:
Feb. 04, 2020
Applicants:
Tokuyama Corporation, Yamaguchi, JP;
Screen Holdings Co., Ltd., Kyoto, JP;
Inventors:
Yoshiki Seike, Yamaguchi, JP;
Seiji Tono, Yamaguchi, JP;
Kenji Kobayashi, Kyoto, JP;
Sei Negoro, Kyoto, JP;
Assignees:
Tokuyama Corporation, Yamaguchi, JP;
SCREEN Holdings Co., Ltd., Kyoto, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C09K 13/00 (2006.01); H01L 21/3213 (2006.01); H01L 21/306 (2006.01);
U.S. Cl.
CPC ...
C09K 13/00 (2013.01); H01L 21/30604 (2013.01); H01L 21/32134 (2013.01);
Abstract
A silicon etching solution includes a mixed solution comprising a quaternary alkylammonium hydroxide and water and further comprises a compound represented by the following formula (1):RO—(CHO)—R  (1)wherein Ris a hydrogen atom or an alkyl group having 1 to 3 carbon atoms, Ris a hydrogen atom or an alkyl group having 1 to 6 carbon atoms, m is an integer of 2 to 6, and n is 1 or 2.