The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2022

Filed:

May. 01, 2018
Applicants:

Zeon Corporation, Tokyo, JP;

National University Corporation Nagoya University, Nagoya, JP;

Inventors:

Kousuke Isobe, Tokyo, JP;

Sadaharu Hashimoto, Tokyo, JP;

Atsushi Nozawa, Tokyo, JP;

Ryoji Kameyama, Tokyo, JP;

Atsushi Noro, Nagoya, JP;

Takato Kajita, Nagoya, JP;

Yushu Matsushita, Nagoya, JP;

Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 53/02 (2006.01); C08J 5/18 (2006.01); C08F 297/08 (2006.01);
U.S. Cl.
CPC ...
C08L 53/025 (2013.01);
Abstract

A main object of the present invention is to provide a block copolymer composition which has good elasticity, while having excellent stress relaxation properties. The object is achieved by providing a block copolymer composition obtained by a modification treatment, the block copolymer composition comprising a block copolymer B formed by introducing a functional group capable of forming a non-covalent bond into a block copolymer A including at least one aromatic vinyl polymer block and at least one conjugated diene polymer block.


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