The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2022
Filed:
Jun. 28, 2021
Applicant:
Sumitomo Chemical Company, Limited, Tokyo, JP;
Inventors:
Assignee:
SUMITOMO CHEMICAL COMPANY, LIMITED, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08L 23/06 (2006.01); C08J 3/00 (2006.01); B29C 48/36 (2019.01); C08K 5/14 (2006.01);
U.S. Cl.
CPC ...
C08L 23/06 (2013.01); B29C 48/36 (2019.02); C08J 3/005 (2013.01); B29K 2023/06 (2013.01); C08K 5/14 (2013.01); C08L 2203/16 (2013.01); C08L 2207/066 (2013.01);
Abstract
Provided are an ethylene-based polymer capable of obtaining a film in which thickness unevenness is reduced, a method of producing the ethylene-based polymer, and a film containing the ethylene-based polymer. In the ethylene-based polymer according to the present invention, the following Expressions (1) and (2) are satisfied:0.362≤η≤0.466  (1)0.0282≤51≤0.0328  (2).