The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.

The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.

Date of Patent:
Oct. 11, 2022

Filed:

Dec. 05, 2018
Applicant:

Lg Chem, Ltd., Seoul, KR;

Inventors:

Ji Hyun Kim, Daejeon, KR;

Jung Eun Kim, Daejeon, KR;

Yong Seok Jung, Daejeon, KR;

Assignee:
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
C08F 236/12 (2006.01); C08F 8/34 (2006.01); C08F 8/46 (2006.01); C08K 3/16 (2006.01); C08K 3/22 (2006.01); C08K 3/30 (2006.01); C08L 9/04 (2006.01);
U.S. Cl.
CPC ...
C08F 236/12 (2013.01); C08F 8/34 (2013.01); C08F 8/46 (2013.01); C08K 3/16 (2013.01); C08K 3/22 (2013.01); C08K 3/30 (2013.01); C08L 9/04 (2013.01);
Abstract

Provided is a carboxylic acid-modified nitrile-based copolymer latex, and more particularly, provided are a carboxylic acid-modified nitrile-based copolymer latex which includes a carboxylic acid-modified nitrile-based copolymer including a monomer-derived repeating unit; and a repeating unit derived from a monomer represented by Chemical Formula 1 below, the monomer-derived repeating unit including a conjugated diene-based monomer-derived repeating unit, an ethylenically unsaturated nitrile-based monomer-derived repeating unit, and an ethylenically unsaturated acid monomer-derived repeating unit (see description of the present invention), a method for preparing a carboxylic acid-modified nitrile-based copolymer latex, a latex composition for dip-forming including the copolymer latex, and an article formed by the composition.


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