The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2022
Filed:
Mar. 17, 2021
Applicant:
Canon Kabushiki Kaisha, Tokyo, JP;
Inventors:
Kenji Tamamori, Kanagawa, JP;
Kazuhiro Asai, Kanagawa, JP;
Tetsushi Ishikawa, Tokyo, JP;
Seiichiro Yaginuma, Kanagawa, JP;
Assignee:
Canon Kabushiki Kaisha, Tokyo, JP;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41J 2/16 (2006.01); G03F 7/20 (2006.01);
U.S. Cl.
CPC ...
B41J 2/1631 (2013.01); B41J 2/162 (2013.01); G03F 7/70058 (2013.01);
Abstract
A manufacturing method for a structure includes preparing a dry film supported on one surface of a support; bonding the dry film to a substrate so that the dry film and the substrate are in contact with each other; performing first exposure of the dry film bonded to the substrate via the support; removing the support after the first exposure; performing second exposure of the dry film after the support is removed via a photomask; and developing the dry film after the first exposure and the second exposure.