The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2022
Filed:
Dec. 09, 2019
Applicant:
Agfa NV, Mortsel, BE;
Inventors:
Peter Hendrikx, Mortsel, BE;
Thomas Billiet, Mortsel, BE;
Johan Loccufier, Mortsel, BE;
Katleen Himschoot, Mortsel, BE;
Sue Wilkinson, Mortsel, BE;
Assignee:
AGFA Offset BV, Mortsel, BE;
Attorney:
Primary Examiner:
Int. Cl.
CPC ...
B41C 1/10 (2006.01); G03F 7/004 (2006.01); G03F 7/016 (2006.01); G03F 7/029 (2006.01);
U.S. Cl.
CPC ...
B41C 1/1033 (2013.01); B41C 1/1016 (2013.01); G03F 7/0045 (2013.01); G03F 7/0166 (2013.01); G03F 7/029 (2013.01); B41C 2210/04 (2013.01);
Abstract
A method of lithographic plate making is disclosed wherein a plate precursor is exposed to laser radiation in the wavelength range from 350 to 450 nm, said plate precursor comprising a hydrophilic support and a photopolymerizable or photocrosslinkable image recording layer, and then processed on-press by supplying fountain and ink. The exposure produces a visible image having a 1976 CIELAB color distance ΔE between exposed and non-exposed areas of at least 2.5.