The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 11, 2022
Filed:
Jun. 08, 2020
Raytheon Technologies Corporation, Farmington, CT (US);
Bart A. Van Hassel, Weatogue, CT (US);
RAYTHEON TECHNOLOGIES CORPORATION, Farmington, CT (US);
Abstract
An additive processing method includes providing a cover gas in a chamber in connection with additive fabrication of an article in the chamber, the cover gas entraining impurities during the additive fabrication, circulating the cover gas with entrained impurities from the chamber into a gas recirculation loop, removing the entrained impurities from the cover gas in the gas recirculation loop to generate a clean cover gas, circulating the clean cover gas into the chamber during the additive fabrication, and metering an amount of new cover gas provided into the chamber from a cover gas source connected to the chamber, the amount being metered with respect to an amount of the clean cover gas circulated into the chamber from the gas recirculation loop.