The patent badge is an abbreviated version of the USPTO patent document. The patent badge does contain a link to the full patent document.
The patent badge is an abbreviated version of the USPTO patent document. The patent badge covers the following: Patent number, Date patent was issued, Date patent was filed, Title of the patent, Applicant, Inventor, Assignee, Attorney firm, Primary examiner, Assistant examiner, CPCs, and Abstract. The patent badge does contain a link to the full patent document (in Adobe Acrobat format, aka pdf). To download or print any patent click here.
Patent No.:
Date of Patent:
Oct. 04, 2022
Filed:
Apr. 19, 2019
Canon Kabushiki Kaisha, Tokyo, JP;
Naosuke Nishimura, Saitama, JP;
CANON KABUSHIKI KAISHA, Tokyo, JP;
Abstract
An imprint apparatus forms a pattern on a substrate by an imprint process which includes a process of bringing an imprint material on the substrate into contact with a mold, a process of curing the imprint material, and a separating process of separating a cured product of the imprint material and the mold. The apparatus includes a substrate holding mechanism which includes a substrate chuck configured to chuck the substrate by sucking the substrate. The substrate chuck has a through hole, and the substrate holding mechanism suppresses a state in which a suction force by which the substrate chuck sucks the substrate is reduced due to the through hole and a gap which is formed between a back surface of the substrate and an upper surface of the substrate chuck in the separating process.